Method of fabricating a solar cell with a tunnel dielectric layer

ABSTRACT

Methods of fabricating solar cells with tunnel dielectric layers are described. Solar cells with tunnel dielectric layers are also described.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.14/157,386, filed Jan. 16, 2014, which is a continuation of U.S. patentapplication Ser. No. 13/677,611, filed Nov. 15, 2012, now U.S. Pat. No.8,709,851, issued Apr. 29, 2014, which is a continuation of U.S. patentapplication Ser. No. 12/829,922, filed Jul. 2, 2010, now U.S. Pat. No.8,334,161, issued Dec. 18, 2012, the entire contents of which are herebyincorporated by reference herein.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

The invention described herein was made with Governmental support undercontract number DE-FC36-07G017043 awarded by the United StatesDepartment of Energy. The Government may have certain rights in theinvention.

TECHNICAL FIELD

Embodiments of the present invention are in the field of renewableenergy and, in particular, methods of fabricating solar cells withtunnel dielectric layers.

BACKGROUND

Photovoltaic cells, commonly known as solar cells, are well knowndevices for direct conversion of solar radiation into electrical energy.Generally, solar cells are fabricated on a semiconductor wafer orsubstrate using semiconductor processing techniques to form a p-njunction near a surface of the substrate. Solar radiation impinging onthe surface of the substrate creates electron and hole pairs in the bulkof the substrate, which migrate to p-doped and n-doped regions in thesubstrate, thereby generating a voltage differential between the dopedregions. The doped regions are connected to metal contacts on the solarcell to direct an electrical current from the cell to an externalcircuit coupled thereto.

Efficiency is an important characteristic of a solar cell as it isdirectly related to the solar cell's capability to generate power.Accordingly, techniques for increasing the efficiency of solar cells aregenerally desirable. Embodiments of the present invention allow forincreased solar cell efficiency by providing novel processes forfabricating solar cell structures.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a model thermal budget for a conventional process ascompared to a reduced thermal budget process for fabricating a tunneldielectric layer in a solar cell, in accordance with an embodiment ofthe present invention.

FIG. 2 illustrates a flowchart representing operations in a method offabricating a solar cell with a tunnel dielectric layer, in accordancewith an embodiment of the present invention.

FIG. 3A illustrates a cross-sectional view of a stage in the fabricationof a solar cell including a tunnel dielectric layer, in accordance withan embodiment of the present invention.

FIG. 3B illustrates a cross-sectional view of a stage in the fabricationof a solar cell including a tunnel dielectric layer, corresponding tooperation 202 of the flowchart of FIG. 2 and to operation 402 of theflowchart of FIG. 4, in accordance with an embodiment of the presentinvention.

FIG. 3C illustrates a cross-sectional view of a stage in the fabricationof a solar cell including a tunnel dielectric layer, corresponding tooperation 204 of the flowchart of FIG. 2 and to operation 404 of theflowchart of FIG. 4, in accordance with an embodiment of the presentinvention.

FIG. 4 illustrates a flowchart representing operations in a method offabricating a solar cell with a tunnel dielectric layer, in accordancewith an embodiment of the present invention.

FIG. 5A illustrates a plot of tunnel oxide thickness after combinedaqueous and thermal growth operations, in accordance with an embodimentof the present invention.

FIG. 5B illustrates a plot of standard deviation of oxide thicknessafter combined aqueous and thermal growth operations, in accordance withan embodiment of the present invention.

FIG. 6A illustrates a plot of minority carrier lifetime as a function ofthickness of the aqueous film component of a tunnel dielectric layer, inaccordance with an embodiment of the present invention.

FIG. 6B illustrates a photoluminescence result of lifetime waferssubjected to oxide formation from a combination of aqueous and thermalprocessing, in accordance with an embodiment of the present invention.

DETAILED DESCRIPTION

Methods of fabricating solar cells with tunnel dielectric layers aredescribed herein. In the following description, numerous specificdetails are set forth, such as specific process flow operations, inorder to provide a thorough understanding of embodiments of the presentinvention. It will be apparent to one skilled in the art thatembodiments of the present invention may be practiced without thesespecific details. In other instances, well-known fabrication techniques,such as lithographic and etch techniques, are not described in detail inorder to not unnecessarily obscure embodiments of the present invention.Furthermore, it is to be understood that the various embodiments shownin the figures are illustrative representations and are not necessarilydrawn to scale.

Disclosed herein are methods of fabricating solar cells with tunneldielectric layers. In one embodiment, a method of fabricating a solarcell includes exposing a surface of a substrate of the solar cell to awet chemical solution to provide an oxide layer on the surface of thesubstrate. The oxide layer is then heated in a dry atmosphere at atemperature near or above 900 degrees Celsius to convert the oxide layerto a tunnel dielectric layer of the solar cell. In one embodiment, amethod of fabricating a solar cell includes forming, at a temperatureless than 600 degrees Celsius, an oxide layer on a surface of asubstrate of the solar cell by thermal oxidation. The oxide layer isthen heated in a dry atmosphere at a temperature near or above 900degrees Celsius to convert the oxide layer to a tunnel dielectric layerof the solar cell.

Also disclosed herein are solar cells. In one embodiment, a solar cellincludes a substrate. A tunnel dielectric layer is disposed on thesubstrate, the tunnel dielectric layer formed by heating an oxide layernear or above 900 degrees Celsius only once.

In accordance with an embodiment of the present invention, the thermalbudget in a polysilicon/tunnel oxide process is reduced. For example, ina convention process, a tunnel oxide may be grown at approximately 900degrees Celsius at relatively low pressure. However, in an embodiment,it has been found that such an approach is inadequate for optimalefficiency due to a high thermal budget. A high thermal budget candisadvantageously increase cycle time and equipment wear, both factorsthat can increase the overall cost of production. In a specificembodiment, it has been found that the conventional approach leads to ahigh cycle time for the polysilicon deposition process.

In accordance with an embodiment of the present invention, a tunneldielectric layer is included in a solar cell to block minority carriers.In one embodiment, the thickness of the tunnel dielectric layer isapproximately 15 Angstroms. However, the thermal budget conventionallyrequired to form such a tunnel dielectric layer may accelerate theformation of defects in other portions of the solar cell, for example inthe substrate of a bulk substrate, back-contact solar cell. Therefore,when applying conventional approaches, there may be a trade-off for thebenefits provided by including a tunnel dielectric layer with thedamaging effects of the increased thermal budget typically needed tofabricate such a layer. Thus, in accordance with an embodiment of thepresent invention, approaches provided herein allow for fabrication of atunnel dielectric layer for use in high efficiency solar cell designs,but with a reduced thermal budget. In one embodiment, by reducing thethermal budget, defects otherwise exacerbated with increased thermalexposure are reduced or mitigated. In a specific embodiment, thefabrication processes used to provide a tunnel dielectric layer arelimited to processes performed at temperatures near or less than 700degrees Celsius, with application of a process near or greater than atemperature of 900 degrees Celsius being used only once in the entireprocess. In a particular embodiment, this approach also reduces theoverall cycle time, increasing the efficiency of in-line fabrication ofsolar cells.

In an embodiment, growth of thin silicon oxide, including silicondioxide (SiO₂), layers for tunnel in structures with polysiliconcontacts is improved in the fabrication of solar cells. For example,improvements may include one or more of the following film attributes: ahigh performance yet thin tunnel dielectric film, controlled thickness,controlled quality, reduced process cycle time, and reduced processthermal budget. In an embodiment, by applying one or more of theapproaches described herein, a very thin silicon oxide (e.g., SiO₂)tunnel oxide with good thickness control across a broad substrate isachieved at a relatively low temperature (e.g., reduced thermal budget)and with a relatively short cycle time. In one embodiment, a peaktemperature of approximately 565 degrees Celsius is used and the cycletime is reduced by approximately 1.5 hours in a process furnace. In oneembodiment, the formation of an aqueous oxide renders wafers lesssusceptible to contamination. The above embodiments are contrasted to aconvention approach which may include growth at approximately 900degrees Celsius at approximately 500 mTorr of pressure.

In accordance with an embodiment of the present invention, a combinationof aqueous and thermal oxide growth is used to achieve a thin, yet highquality oxide film. In one embodiment, the thickness of the oxide filmis approximately in the range of 1-2 nanometers. In an embodiment, acombination of oxidants, solution chemistries, and illumination is usedto increase the growth rate of an oxide and improve thickness uniformityduring an aqueous growth portion of the process. In one embodiment, aformed oxide is then further thickened during a low temperature thermaloperation that concurrently improves the quality of the aqueous grownportion of the oxide. In an embodiment, aqueous and thermal growthtechniques are combined and a low temperature thermal oxide growthprocess (e.g., reduced thermal budget) is performed to provide a highquality tunnel dielectric layer.

In an aspect of the present invention, a thermal budget is reduced incomparison to a conventional approach in the fabrication of a tunneldielectric layer. For example, FIG. 1 illustrates a model thermal budgetfor a conventional process as compared to a reduced thermal budgetprocess for fabricating a tunnel dielectric layer in a solar cell, inaccordance with an embodiment of the present invention.

Referring to FIG. 1, a plot 100 of model thermal budget is demonstratedfor temperature, in degrees Celsius, as a function of elapsed time, inminutes, for a conventional process 102 and a reduced thermal budgetprocess 104, in accordance with an embodiment of the present invention.In one embodiment, the conventional process 102 involves heating near toor above approximately 900 degrees Celsius more than once in thefabrication of a tunnel dielectric layer. By contrast, in oneembodiment, the reduced thermal budget process 104 involves heating nearto or above approximately 900 degrees Celsius only once in thefabrication of a tunnel dielectric layer, as depicted in FIG. 1.

A solar cell may be fabricated to include a tunnel dielectric layer. Forexample, FIG. 2 illustrates a flowchart 200 representing operations in amethod of fabricating a solar cell with a tunnel dielectric layer, inaccordance with an embodiment of the present invention. FIGS. 3A-3Cillustrate cross-sectional views of various stages in the fabrication ofa solar cell including a tunnel dielectric layer, corresponding tooperations of flowchart 200, in accordance with an embodiment of thepresent invention.

Referring to FIG. 3A, a substrate 302 for solar cell manufacturing isprovided. In accordance with an embodiment of the present invention,substrate 302 is composed of a bulk silicon substrate. In oneembodiment, the bulk silicon substrate is doped with N-type dopants. Inan embodiment, substrate 302 has a textured surface, as is depicted inFIG. 3A.

Referring to operation 202 of flowchart 200, and corresponding FIG. 3B,a method of fabricating a solar cell includes exposing a surface ofsubstrate 302 to a wet chemical solution to provide an oxide layer 304on the surface of substrate 302. In accordance with an embodiment of thepresent invention, the wet chemical solution includes an oxidizer suchas, but not limited to, ozone (O₃) or hydrogen peroxide (H₂O₂). In oneembodiment, the wet chemical solution and the surface of the substrateare exposed to visible light radiation during oxide growth. In anembodiment, substrate 302 is a bulk silicon substrate and oxide layer304 is a silicon oxide layer.

Referring to operation 204 of flowchart 200, and corresponding FIG. 3C,the method of fabricating a solar cell further includes heating oxidelayer 304 in a dry atmosphere at a temperature near or above 900 degreesCelsius to convert oxide layer 304 to a tunnel dielectric layer 306 ofthe solar cell. In accordance with an embodiment of the presentinvention, oxide layer 304 is exposed to a temperature near or above 900degrees Celsius only once during the fabricating. In an embodiment,subsequent to the exposing of operation 202 and prior to the heating ofoperation 204, oxide layer 304 is heated from a temperature below 500degrees Celsius, to a temperature of approximately 565 degrees Celsius,and then cooled back to a temperature below 500 degrees Celsius.

In accordance with an embodiment of the present invention, the method offabricating a solar cell further includes forming a material layer 308above oxide layer 304 prior to the heating of operation 204. In oneembodiment, material layer 308 is an amorphous silicon layer, and theamorphous silicon layer is crystallized to a polysilicon layer duringthe heating of operation 204. In a specific embodiment, the method offabricating a solar cell further includes forming a metal contact 312above the polysilicon layer 308, as depicted in FIG. 3C.

Thus, referring again to FIG. 3C, and in accordance with an embodimentof the present invention, a solar cell includes a substrate 302. Atunnel dielectric layer 306 is disposed on substrate 302, the tunneldielectric layer formed by heating an oxide layer (304 from FIG. 3B)near or above 900 degrees Celsius only once. In one embodiment, thesolar cell further includes a polysilicon layer 308 disposed abovetunnel dielectric layer 306. In a specific embodiment, the solar cell offurther includes a metal contact 312 disposed above polysilicon layer308. In an embodiment, substrate 302 is a bulk silicon substrate andtunnel dielectric layer 306 is a silicon oxide layer.

In an embodiment, the solar cell is a back-contact solar cell. In thatembodiment, the back contact solar cell includes P-type and N-typeactive regions in substrate 302. Conductive contacts, such as contact312, are coupled to the active regions and are separated from oneanother by isolation regions, such as isolation regions 310 which may becomposed of a dielectric material. In an embodiment, the solar cell is aback-contact solar cell and an anti-reflective coating layer is disposedon the light-receiving surface, such as the random textured surfacedepicted in FIGS. 3A-3C. In one embodiment, the anti-reflective coatinglayer is a layer of silicon nitride with a thickness approximately inthe range of 70-80 nanometers.

In another aspect of the present invention, a solar cell may befabricated by to include a tunnel dielectric layer without the use of anaqueous treatment. For example, FIG. 4 illustrates a flowchart 400representing operations in a method of fabricating a solar cell with atunnel dielectric layer, in accordance with an embodiment of the presentinvention. FIGS. 3A-3C illustrate cross-sectional views of variousstages in the fabrication of a solar cell including a tunnel dielectriclayer, corresponding to operations of flowchart 400, in accordance withan embodiment of the present invention.

Referring to FIG. 3A, a substrate 302 for solar cell manufacturing isprovided. In accordance with an embodiment of the present invention,substrate 302 is composed of a bulk silicon substrate. In oneembodiment, the bulk silicon substrate is doped with N-type dopants. Inan embodiment, substrate 302 has a textured surface, as is depicted inFIG. 3A.

Referring to operation 402 of flowchart 400, and corresponding FIG. 3B,a method of fabricating a solar cell includes forming, at a temperatureless than 600 degrees Celsius, an oxide layer 304 on a surface ofsubstrate 302 of the solar cell by thermal oxidation. In accordance withan embodiment of the present invention, oxide layer 304 is formed by alow-pressure thermal oxidation process. In one embodiment, thelow-pressure thermal oxidation process is performed at a temperatureapproximately in the range of 500-580 degrees Celsius in an atmosphereincluding oxygen (O₂). In an embodiment, substrate 302 is a bulk siliconsubstrate and oxide layer 304 is a silicon oxide layer.

Referring to operation 404 of flowchart 400, and corresponding FIG. 3C,the method of fabricating a solar cell further includes heating oxidelayer 304 in a dry atmosphere at a temperature near or above 900 degreesCelsius to convert oxide layer 304 to a tunnel dielectric layer 306 ofthe solar cell. In accordance with an embodiment of the presentinvention, oxide layer 304 is exposed to a temperature near or above 900degrees Celsius only once during the fabricating. In an embodiment,subsequent to the forming of operation 402 and prior to the heating ofoperation 404, oxide layer 304 is heated from a temperature below 500degrees Celsius, to a temperature of approximately 565 degrees Celsius,and then cooled back to a temperature below 500 degrees Celsius.

In accordance with an embodiment of the present invention, the method offabricating a solar cell further includes forming a material layer 308above oxide layer 304 prior to the heating of operation 404. In oneembodiment, material layer 308 is an amorphous silicon layer, and theamorphous silicon layer is crystallized to a polysilicon layer duringthe heating of operation 404. In a specific embodiment, the method offabricating a solar cell further includes forming a metal contact 312above the polysilicon layer 308, as depicted in FIG. 3C.

As described above, in an aspect of the present invention, a tunneldielectric layer (e.g., a tunnel oxide layer) may be fabricated by acombination of aqueous and thermal treatments of a substrate. FIGS.5A-5B illustrate plots 500A and 500B, respectively, of tunnel oxidethickness and standard deviation of oxide thickness, respectively, aftercombined aqueous and thermal growth operations, in accordance with anembodiment of the present invention. Referring to plots 500A and 500B,the aqueous growth time, solution zone concentration and temperaturewere varied. As a reference, the thermal oxidation performed was thesame in all cases. FIG. 6A illustrates a plot 600A of minority carrierlifetime as a function of thickness of the aqueous film component of atunnel dielectric layer, in accordance with an embodiment of the presentinvention. FIG. 6B illustrates a photoluminescence result 600B oflifetime wafers subjected to oxide formation from a combination ofaqueous and thermal processing, in accordance with an embodiment of thepresent invention. As evidenced from the variety of film typesfabricated shown in the above plots, and in accordance with anembodiment of the present invention, specific desired properties for atunnel dielectric film may be tuned by tuning the aqueous treatmentportion of the growth process.

As described above, in another aspect of the present invention, a tunneldielectric layer (e.g., a tunnel oxide layer) may be fabricated byexposing an oxide layer to a temperature greater than approximately 900degrees Celsius only once during the fabricating. In an embodiment,thermal oxidation is performed at a temperature near or substantiallythe same as the temperature desired for the next fabrication step. Onesuch step can be the formation of a silicon layer above the tunnel oxidelayer. Accordingly, in one embodiment, thermal oxidation is performed atonly approximately 575 degrees Celsius.

Thus, methods of fabricating solar cells with tunnel dielectric layershave been disclosed. In accordance with an embodiment of the presentinvention, a method of fabricating a solar cell includes exposing asurface of a substrate of the solar cell to a wet chemical solution toprovide an oxide layer on the surface of the substrate. The method alsoincludes heating the oxide layer in a dry atmosphere at a temperaturenear or above 900 degrees Celsius to convert the oxide layer to a tunneldielectric layer of the solar cell. In one embodiment, the oxide layeris exposed to a temperature near or above 900 degrees Celsius only onceduring the fabricating. In accordance with another embodiment of thepresent invention, a method of fabricating a solar cell includesforming, at a temperature less than 600 degrees Celsius, an oxide layeron a surface of a substrate of the solar cell by thermal oxidation. Themethod also includes heating the oxide layer in a dry atmosphere at atemperature near or above 900 degrees Celsius to convert the oxide layerto a tunnel dielectric layer of the solar cell. In one embodiment, theoxide layer is exposed to a temperature near or above 900 degreesCelsius only once during the fabricating.

1. (canceled)
 2. A method of fabricating a solar cell, the methodcomprising: forming, at a first temperature, a surface oxide layerdisposed on the substrate by thermal oxidation; and heating, the surfaceoxide layer from a temperature below 500 degrees Celsius, to a secondtemperature above 500 degrees Celsius, wherein the first and secondtemperature are approximately the same.
 3. The method of claim 2,wherein the first and the second temperature are approximately 565degrees Celsius.
 4. The method of claim 2, wherein the surface oxidelayer is formed by a low-pressure thermal oxidation process.
 5. Themethod of claim 2, wherein the low-pressure thermal oxidation process isperformed in an atmosphere comprising oxygen (O2).
 6. The method ofclaim 2, further comprising forming a polysilicon layer during theheating.
 7. The method of claim 6, further comprising forming a metalcontact above the polysilicon layer.
 8. The method of claim 2, whereinthe substrate comprises silicon and the oxide layer comprises siliconoxide.
 9. A method of fabricating a solar cell, the method comprising:consuming a portion of a substrate of the solar cell to provide asurface oxide layer of the substrate, wherein the consuming comprisesexposing the substrate to a wet chemical solution; and heating thesurface oxide layer from a temperature below 500 degrees Celsius, to atemperature above 500 degrees Celsius.
 10. The method of claim 9,further comprising, subsequent to heating the surface oxide layer to atemperature above 500 degrees Celsius, cooling back to a temperaturebelow 500 degrees Celsius.
 11. The method of claim 9, wherein heatingthe surface oxide layer to the temperature above 500 degrees Celsiuscomprises heating to a temperature of approximately 565 degrees Celsius.12. The method of claim 9, wherein the wet chemical solution comprisesan oxidizer selected from the group consisting of ozone (O₃) andhydrogen peroxide (H₂O₂).
 13. The method of claim 9, wherein thesubstrate comprises silicon and the oxide layer comprises silicon oxide.14. The method of claim 9, further comprising forming a polysiliconlayer during the heating.
 15. The method of claim 14, further comprisingforming a metal contact above the polysilicon layer.
 16. A method offabricating a solar cell, the method comprising: consuming a portion ofa substrate of the solar cell to provide a surface oxide layer of thesubstrate, wherein the consuming comprises performing a thermaloxidation process; and heating the surface oxide layer from atemperature below 500 degrees Celsius, to a temperature above 500degrees Celsius.
 17. The method of claim 16, further comprising,subsequent to heating the surface oxide layer to a temperature above 500degrees Celsius, cooling back to a temperature below 500 degreesCelsius.
 18. The method of claim 16, wherein the surface oxide layer isformed by a low-pressure thermal oxidation process.
 19. The method ofclaim 16, wherein the low-pressure thermal oxidation process isperformed in an atmosphere comprising oxygen (O₂).
 20. The method ofclaim 16, further comprises forming a polysilicon layer during theheating.
 21. The method of claim 20, further comprising forming a metalcontact above the polysilicon layer.